The “Guide for the measurement of smooth surface topography using coherence scanning interferometry” (Good Practice Guide No. 108) is now available from the National Physical Laboratory (NPL).
This document gives guidance on the measurement of the topography of semiconductors, epitaxial wafers and optical thin film coatings, and can be applied to many flat, smooth surface topography measurements.
This good practice guide has been written to assist users in the effective measurement and analysis of smooth surfaces using coherence scanning interferometry (CSI), commonly referred to as ‘vertical scanning white light interferometry’.
To download or to order a paper copy of the “Guide for the measurement of smooth surface topography using coherence scanning interferometry” (Measurement Good Practice Guide No. 108), visit: